Petres, Roman:Crystalline Silicon Surface Passivation by Amorphous Silicon Compounds
- Pasta blanda 2011, ISBN: 9783838128795
[ED: Softcover], [PU: Südwestdeutscher Verlag für Hochschulschriften], Solar cells based on crystalline silicon (c-Si) have the potential to make photovoltaic electricity cheaper than coa… Más…
[ED: Softcover], [PU: Südwestdeutscher Verlag für Hochschulschriften], Solar cells based on crystalline silicon (c-Si) have the potential to make photovoltaic electricity cheaper than coal-based electric power generation within less than 10 years. The largest cost decrease potential on the cell level lies with improved electronic surface passivation. In this work, the current industry standard, amorphous silicon nitride (a-SiNx:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD), is investigated and compared to amorphous silicon carbide, silicon carbonitride and silicon oxynitride films deposited by both high- and for the first time also low-frequency (LF) PECVD. It is shown that and an explanation offered as to why LF PECVD is capable of excellent surface passivation, comparable to remote-plasma results in literature and higher than previously published for LF PECVD. The achieved surface passivation quality is sufficient for dielectric rear-surface passivation without an underlying diffused back surface field. It is also shown that the purity grade of precursor gases used for film deposition can be lowered significantly without affecting cell efficiency and long-term stability on the module level, allowing for further cost reduction.
2011. 116 S. 220 mm
Versandfertig in 6-10 Tagen, DE, [SC: 0.00], Neuware, gewerbliches Angebot, Offene Rechnung (Vorkasse vorbehalten)<
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Petres Roman:Crystalline Silicon Surface Passivation by Amorphous Silicon Compounds
- Pasta blanda ISBN: 9783838128795
Paperback, [PU: Sudwestdeutscher Verlag Fur Hochschulschriften AG], Solar cells based on crystalline silicon (c-Si) have the potential to make photovoltaic electricity cheaper than coal-b… Más…
Paperback, [PU: Sudwestdeutscher Verlag Fur Hochschulschriften AG], Solar cells based on crystalline silicon (c-Si) have the potential to make photovoltaic electricity cheaper than coal-based electric power generation within less than 10 years. The largest cost decrease potential on the cell level lies with improved electronic surface passivation. In this work, the current industry standard, amorphous silicon nitride (a-SiNx: H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD), is investigated and compared to amorphous silicon carbide, silicon carbonitride and silicon oxynitride films deposited by both high- and for the first time also low-frequency (LF) PECVD. It is shown that and an explanation offered as to why LF PECVD is capable of excellent surface passivation, comparable to remote-plasma results in literature and higher than previously published for LF PECVD. The achieved surface passivation quality is sufficient for dielectric rear-surface passivation without an underlying diffused back surface field. It is also shown that the purity grade of precursor gases used for film deposition can be lowered significantly without affecting cell efficiency and long-term stability on the module level, allowing for further cost reduction, Physics<
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Crystalline Silicon Surface Passivation by Amorphous Silicon Compounds
- libro nuevoISBN: 9783838128795
Solar cells based on crystalline silicon (c-Si) have the potential to make photovoltaic electricity cheaper than coal-based electric power generation within less than 10 years. The larges… Más…
Solar cells based on crystalline silicon (c-Si) have the potential to make photovoltaic electricity cheaper than coal-based electric power generation within less than 10 years. The largest cost decrease potential on the cell level lies with improved electronic surface passivation. In this work, the current industry standard, amorphous silicon nitride (a-SiNx:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD), is investigated and compared to amorphous silicon carbide, silicon carbonitride and silicon oxynitride films deposited by both high- and for the first time also low-frequency (LF) PECVD. It is shown that and an explanation offered as to why LF PECVD is capable of excellent surface passivation, comparable to remote-plasma results in literature and higher than previously published for LF PECVD. The achieved surface passivation quality is sufficient for dielectric rear-surface passivation without an underlying diffused back surface field. It is also shown that the purity grade of precursor gases used for film deposition can be lowered significantly without affecting cell efficiency and long-term stability on the module level, allowing for further cost reduction. Bücher, Hörbücher & Kalender / Bücher / Sachbuch / Naturwissenschaften / Physik<
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Petres, Roman:Crystalline Silicon Surface Passivation by Amorphous Silicon Compounds Modeling, experiments, solar cells and modules
- libro nuevo 2015, ISBN: 3838128796
Kartoniert / Broschiert Physik, Protège-cahier 11, [PU:Südwestdeutscher Verlag für Hochschulschriften AG Co. KG]
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Petres, Roman: Crystalline Silicon Surface Passivation by Amorphous Silicon Compounds
- libro nuevoISBN: 9783838128795
Modeling, experiments, solar cells and modules Modeling, experiments, solar cells and modules Bücher > Wissenschaft > Physik
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