ISBN: 9789048145102
Application of Particle and Laser Beams in Materials Technology Please note: this item is printed on demand and will take extra time before it can be dispatched to you (up to 20 workin… Más…
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2010, ISBN: 9789048145102
redacteur: Misaelides, P. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1995, 691 Seiten, Publiziert: 2010-12-03T00:00:01Z, Produktgruppe: Book, 2.41 kg, Materialen… Más…
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2010, ISBN: 9789048145102
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[ED: Kartoniert / Broschiert], [PU: Springer Netherlands], Proceedings of the NATO Advanced Study Institute, Kallithea, Chalkidiki, Greece, May 8--21, 1994 The development of advanced ma… Más…
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2010, ISBN: 9789048145102
Paperback, New., 678 p. Nato Science Series E: , 283. XIII, 678 p. Intended for professional and scholarly audience., Dordrecht, [PU: Springer]
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2010, ISBN: 9789048145102
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ISBN: 9789048145102
Application of Particle and Laser Beams in Materials Technology Please note: this item is printed on demand and will take extra time before it can be dispatched to you (up to 20 workin… Más…
2010, ISBN: 9789048145102
redacteur: Misaelides, P. Springer, Paperback, Auflage: Softcover reprint of hardcover 1st ed. 1995, 691 Seiten, Publiziert: 2010-12-03T00:00:01Z, Produktgruppe: Book, 2.41 kg, Materialen… Más…
2010
ISBN: 9789048145102
Pasta blanda
[ED: Kartoniert / Broschiert], [PU: Springer Netherlands], Proceedings of the NATO Advanced Study Institute, Kallithea, Chalkidiki, Greece, May 8--21, 1994 The development of advanced ma… Más…
2010, ISBN: 9789048145102
Paperback, New., 678 p. Nato Science Series E: , 283. XIII, 678 p. Intended for professional and scholarly audience., Dordrecht, [PU: Springer]
Application of Particle and Laser Beams in Materials Technology (Nato Science Series E: (closed)) - Pasta blanda
2010, ISBN: 9789048145102
Pasta dura
Springer, 2010-12-02. Softcover reprint of hardcover 1. Paperback. Used:Good., Springer, 2010-12-02, 0
Datos bibliográficos del mejor libro coincidente
Detalles del libro - Application of Particle and Laser Beams in Materials Technology: 283
EAN (ISBN-13): 9789048145102
ISBN (ISBN-10): 9048145104
Tapa dura
Tapa blanda
Año de publicación: 2010
Editorial: Springer
696 Páginas
Peso: 1,034 kg
Idioma: eng/Englisch
Libro en la base de datos desde 2011-10-06T00:44:58-05:00 (Mexico City)
Página de detalles modificada por última vez el 2023-07-17T05:10:23-06:00 (Mexico City)
ISBN/EAN: 9789048145102
ISBN - escritura alterna:
90-481-4510-4, 978-90-481-4510-2
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Título del libro: materials and technology, laser, application materials, materials science, beams
Datos del la editorial
Autor: P. Misaelides
Título: NATO Science Series E:; Application of Particle and Laser Beams in Materials Technology
Editorial: Springer; Springer Netherland
678 Páginas
Año de publicación: 2010-12-03
Dordrecht; NL
Impreso en
Idioma: Inglés
320,99 € (DE)
329,99 € (AT)
354,00 CHF (CH)
POD
XIII, 678 p.
BC; Hardcover, Softcover / Technik/Maschinenbau, Fertigungstechnik; Werkstoffprüfung; Verstehen; Vakuuminjektionsverfahren; advanced materials; alloy; laser; surface; surface analysis; Characterization and Analytical Technique; Surfaces, Interfaces and Thin Film; Condensed Matter Physics; Nuclear Physics; Materialwissenschaft; Physik der kondensierten Materie (Flüssigkeits- und Festkörperphysik); Atom- und Molekularphysik; BB; EA
I. Fundamentals.- Fundamental Aspects of Ion Electron Interactions.- Fundamentals of Ion-Solid Interactions: Atomic Collisions.- Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron — Target-Electron Interactions.- Radiation Induced Point Defects and Diffusion.- High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams.- Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties.- II. Surface Analysis Techniques.- An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds.- Depth Profiling in Combination with Sputtering.- A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflector.- Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001).- Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO2 under Ion Bombardment.- Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics.- III. Laser Beams in Materials Technology.- The Raman Approach to Materials Science.- Laser-Material Interaction. Plasma Formation and Applications.- Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids.- In Situ Laser Beam Probes for Semiconductor Processing.- Laser Deposition and Patterning of Diamond Films.- Laser-Raman Spectroscopy of Some Lanthanide/Hgl2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL).- IV. Accelerator-Based Techniques in Materials Technology.- Accelerators in Materials Research.- Application of Elastic Recoil Detection in Materials Analysis.- Applications of High Energy Ion Scattering in Materials Science.- High Energy HeavyIon RBS, ERDA and Channelling.- Some New Detection Techniques for Light-Ion Scattering Analysis.- Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na.- Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis.- Thin Layer Activation in Materials Technology.- Optimum Industrial Application of the Thin Layer Activation Technique.- Ion Beam Analysis of Glasses — Industrial Applications.- Nuclear Reaction Analysis of Corroded Glass Surfaces.- Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials.- Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGE.- Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems.- Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips.- Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium.- Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence.- Modern Technological Projects with High Power Electron Beams.- Computer-Aided Design of Technological Electron-Optical Systems.- Ion Beam Mixing.- Materials Modification Using Electron Beams.- Deposition and Etching Mechanisms in Plasma Thin Film Processes.- Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation.- SIMOX Thin Films. Structural and Electrical Characterisation using FTIR Spectroscopy.- The Key Role of Electron Beams in IC Technology.- Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin FilmsPrepared by RF-Sputtering: Growth and Physical Characterisation.- VI. Synchrotron Radiation.- Synchrotron Radiation Sources for Materials Technology.- Photoemission and EXAFS Study of Na on 2H-TaS2.- Characterisation of Nearly Stoichiometric Buried SixNy Films with EXAFS and NEXAFS.- List of Contributors.- List of Participants.Más, otros libros, que pueden ser muy parecidos a este:
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